Film Thickness And Optical Constants Measurements By Spectroscopic Ellipsometry
•Brochure: Spectroscopic Ellipsometry
•Brochure: Liquid Crystal Modulation Spectroscopic Ellipsometer
•Brochure: PZ2000 - Automatic Laser Ellipsometer/Reflectometer Measurement Of Thickness, Refractive Index And Reflectivity Ellipsometer
Ellipsometry is an optical non destructive technique allowing the accurate characterization of thin films, surface and interface. It is capable of determining layer thickness from 1 Å to tens of microns, optical constants, composition, anisotropy, crystallinity and uniformity.
Spectroscopic Ellipsometers
Unique technologies providing the most sensitive, accurate measurement along with advanced thin film characterization capabilities.
Laser Ellipsometers
Cost effective, upgradeable solution for simple metrology applications.
In-Situ Ellipsometers
High precision, high speed monitoring and control of thin film deposition or etch processes.
Fully Automated Ellipsometers
Designed for the semiconductor industry allowing reliable in-line process control and high yield production.
Large Area Metrology Systems
Designed for the display industry, capable to handle up to 7th generation display substrates.
Software
DeltaPsi2 is a new generation of software based on a common GUI frame, and has been designed to provide intuitive and comprehensive user interaction with the system. The multitasking software provides the ultimate in versatility for use in ex-situ and in-situ configurations as well as the ability to drive fully automatic ellipsometers.
Click Here To Download:
•Brochure: Spectroscopic Ellipsometry
•Brochure: Liquid Crystal Modulation Spectroscopic Ellipsometer
•Brochure: PZ2000 - Automatic Laser Ellipsometer/Reflectometer Measurement Of Thickness, Refractive Index And Reflectivity Ellipsometer