Introduction To Thin Substrate, Dichroic And Polychroic Thin Film Filters Featuring Flatness < 0.1 Waves RMS

Alluxa introduces a new line of thin substrate ultra-flat dichroics and polychroic filters for use in imaging applications that require flatness levels exceeding 0.1 waves RMS per inch. These filters are unique because they achieve flatness by eliminating the high stresses of asdeposited traditional ion-based coating process such as Ion Beam Sputtering (IBS) and Ion Assisted Deposition (IAD). Alluxa’s new technique uses a novel plasma coating process that produces low loss, fully dense dielectric films with essentially net zero stress on the primary coated side. This white paper further discusses their design and use in a variety of applications.