Driving Innovation In Semiconductor Lithography And Metrology

Opto Diode Corporation specializes in designing and manufacturing advanced SXUV and UVG series photodiodes tailored for use in cutting-edge semiconductor lithography, metrology, and inspection equipment. Supporting next-generation manufacturing tools, their sensors provide industry-leading sensitivity and stability, reliably detecting wavelengths from 1 nm to 400 nm. Devices such as the SXUV100, UVG100, UVG5S, SXUV20C, and UVG20S models cover varied detection ranges and active areas to meet specific customer needs in EUV and DUV applications, including wafer steppers and mask inspection systems.

Opto Diode’s vertically integrated processes enable precise customization of detector geometry, spectral responsivity, and thin-film coatings—crucial for optimizing performance at key lithography wavelengths such as 13.5 nm, 193 nm, and 248 nm. Their photodiodes are engineered for high-speed response with low capacitance and exhibit low noise and minimal degradation even under extreme UV exposure and high-power laser environments.

Rigorous testing—including thermal cycling, high-temperature exposure, and long-term stability validation—ensures durability and reliability in semiconductor fabs, aerospace systems, and research facilities. Mechanical designs facilitate vacuum compatibility and low outgassing, supporting integration into cleanrooms and harsh environments. By leveraging decades of expertise, U.S.-based manufacturing, and ITAR-compliant processes, Opto Diode provides traceable, application-ready solutions that simplify system integration, accelerate innovation, and maintain measurement accuracy for diverse, mission-critical platforms spanning lithography, metrology, and advanced R&D instrumentation.