SPIE Photomask Technology Exhibition 2014
September 16 - 17, 2014 - Monterey WA USSPIE - The international society for optics and photonics
customerservice@spie.org
Phone:1 360 676 3290
Come to the mask industry's premier event and meet with the key suppliers of components, software, and manufacturing equipment in the mask industry. Meet top researchers and engineers in the mask-making field. Connect to technical leaders at the top companies. Exhibit at Photomask to generate new sales leads, meet with existing customers, and see the latest technology. Featured technologies: + Electron-beam lithography + EUV + Metrology + Lasers + Nanotechnology + Optical/laser microlithography + Resist technology and processing + Software + Electronic imaging components AUDIENCE + Engineers and designers + Corporate managers from the industry + Application and product developers + Mask and chip designers + Resist chemists + Quality assurance specialists + Experts in mask infrastructure and mask integration + People working in emerging mask technologies Exhibition Dates and Hours: Tuesday 16 September | 10:00 am to 4:30 pm; 6:30 pm to 8:00 pm Wednesday 17 September | 10:00 am to 4:00 pm