Thin Film Reflectometry System: NanoCalc
This thin film reflectometry system analyzes optical layer thickness from 10 nm to ~250 µm and allows for single thickness observation with a 0.1 nm resolution. This system is ideal for in situ, on-line thickness measurements and in removal rate applications. It can also measure the thickness of oxides, SiNx, photoresist, and other semiconductor process films. It also measures anti-reflection coatings, anti-scratch coatings and rough layers on substrates such as steel, aluminum, brass, copper, ceramics and plastics.
Thin film characteristics are typically measured through spectral reflectance/transmission and ellipsometry. The NanoCalc Thin Film Reflectometry System uses the reflectance method and measures the light reflected from a thin film over a wide range of wavelengths, with the incident light normal to the sample surface.
Additional information on the NanoCalc Thin Film Reflectometry System.