SVG Progresses Toward EUV Stepper Deployment

The drive toward multiple generations of extreme ultraviolet (EUV) lithography systems gained further momentum today as the Silicon Valley Group (SVG; San Jose, CA) completed the April critical milestone and design review stipulated by its partnership with the EUV Limited Liability Company (EUV LLC). The EUV LLC is a consortium comprising Intel (Santa Clara, CA), Motorola (Schaumburg, IL)and AMD (Sunnyvale, CA). Silicon Valley Group (SVG), along with the Virtual National Laboratory (VNL) and others, is one of the contributors to the partnership. The next step is the September presentation of a technical and business plans for a first-generation EUV lithography system.

"After much industry deliberation, EUV has emerged as a viable choice for lithographic tools for 70 nm and below," says Noreen Harned of SVG, vice president of the EUV program.

"Our all-optical roadmap completes the technology gap at the 100 nm node with a 157 nm product, "says company president John Shamalz. "Timing of our first generation EUV tools is 2003 with volume production for circuit features at 70 nm and below expected for 2005."

The Virtual National Laboratory comprises Lawrence Berkeley National Laboratory (LBNL), Lawrence Livermore National Laboratory (LLNL) and Sandia National Laboratories (SNL) who work under the auspices of the Department of Energy (DOE).