DSI’s photolithography capability produces patterned thin film coatings (including bandpass filters, absorption coatings, and metals) on substrates up to 6 inches.
DSI’s processes enable high placement accuracy, the ability to accurately maintain coating spectral properties at the smallest geometries, and two-sided patterning capabilities (for flat windows and filters). DSI utilizes both wet and dry film resist processes to support the development and production of challenging patterned coating geometries for our customers.
- Multispectral Filtering
- Light Absorbing Apertures/Picture Frames
- Optical Alignment Fiducials
- Multispectral Sensing/Imaging
- Intelligence, Surveillance, and Reconnaissance (ISR)
- Remote Sensing
- Aerospace Intelligence
- Space Imaging