Leybold Optics Announces Magnetron Sputtering System For Optics Manufacturing

Leybold Optics has expanded its line of Helios sputtering tools for optical coatings with the launch of a tool that features 12 substrate stations that measure 200mm each. Leybold Optics says that the new item produces about three times higher throughput than the standard 100 mm model.

The new HELIOSpro features up to three dual-magnetron sputtering sources working at mid-frequency and operating from metal or sub-oxide targets in a reactive mode, resulting in a high deposition rate. An additional oxygen plasma source is used to achieve fully stoichiometric thin-film layers for high density and low loss.

The substrates are placed on a turntable that rotates at 240 rpm. They are handled by an automatic single-substrate load-lock system, keeping the deposition chamber under vacuum. The chamber has to be opened only once a week for cleaning and exchange of targets. Measurement is done directly on the substrate, in transmission or reflection.

The in situ optical monitoring system operates from the UV to the IR and produces repeatable coatings that are shift-free. The stability of the sputtering process allows a quick turnaround time from design to production. Applications include production of polarizers, beamsplitters, and notch and fluorescent filters.

SOURCE: Leybold Optics USA, Inc.