Infineon Joins EUV LLC Consortium for Advanced Lithography Development

The Extreme Ultraviolet Limited Liability Corp. (Santa Clara, CA) has broadened its reach with the addition of Infineon Technologies (Munich, Germany), its first European member. A consortium of public and private US companies, the EUV LLC focuses on the development of next-generation lithography (NGL).technology through joint research efforts.

Currently, lithography in semiconductor factories is laser-based at 248 nm wavelength (krypton fluoride excimer lasers) that allows the printing of structures as small as 130 nm. The introduction of 193 nm wavelength (argon fluoride excimer lasers) leading down to 100 nm structures has started. The next possible wavelength would be 157 nm (fluorine excimer lasers), which would print lines down to 70 nm. To enable geometries below 70 nm, manufacturer requires a completely new approach to lithography.

Edited by Kristin Lewotsky, Photonics Online