Fast CD & Profile Metrology Solution For The Mask Industry Released
Santa Clara, CA - Timbre Technologies, Inc. announces the release of their Optical Digital Profilometry - Mask (ODP-M) metrology product, TeraGen-M 2.7. The system provides fast, accurate and non-destructive profile metrology of advanced photomasks.
Based on Optical Scatterometry, ODP technology translates diffracted, broadband light off critical mask features into accurate profile information. In addition to measuring critical dimension (CD), TeraGen-M also provides vertical dimension measurement, such as etch depth in phase shift masks, in one single measurement. This mask metrology solution is based on Timbre Technologies, Inc.'s proven ODP solution, which is well established in wafer fabs for CD and profile metrology. Unlike CD-SEM or X-SEM technology, ODP is fast, works in an ambient environment, and doesn't require sample preparation or cleaving of the mask.
The technology of TeraGen-M provides both two-dimensional and three-dimensional metrology capabilities for mask applications, accurately measuring both line/spaces and contacts. In addition to Binary Chrome-on-Glass masks, the product also measures Advanced Phase shift masks, such as Alternating Attenuated Phase Shift Masks (AAPSM), Embedded Phase Shift Masks (EPSM), and Chromeless Masks. TeraGen-M provides CD and etch depth in Phase Shift and Chromeless masks in under three seconds per site.
"The introduction of the TeraGen-M capabilities addresses a real need in the mask marketplace for providing mask critical features like CD and etch depth measurements, accurately and reliably," says Dr. Sanjay Yedur, ODP Mask Product Manager. "Utilizing ODP core technology for critical and evolving mask applications gives our customers a big advantage in time-to-result, accuracy and cost. The need for us to prove ODP-M for advanced technology masks and for sub-65 nm masks is obvious. Our beta customers have now fully signed off on the product and we are confident of releasing a reliable and consistent metrology solution for the complete mask manufacturing process."
SOURCE: Timbre Technologies, Inc.