DynaPulse provides extendibility and leading-edge capabilities to the ArF immersion installed base to further maximize chipmakers’ investment
San Jose, California, February 23, 2015 - Cymer, an ASML company, an industry leader in developing lithography light sources used by chipmakers to pattern advanced semiconductor chips, today announced the shipment of its first XLR® 700ix light source. Enabling higher scanner throughput and process stability for 14nm chip manufacturing and beyond, the XLR 700ix provides improvements in bandwidth, wavelength and energy stability to reduce process variability and increase yield through improvements in wafer critical dimension (CD) uniformity; software enhancements to increase light source predictability and availability; and reduction in helium and power consumption to decrease operating costs.
Cymer also introduced DynaPulse™ as a product upgrade option for OnPulse® customers. DynaPulse enables chipmakers to extend their capital investment and achieve the same performance improvements standard in the XLR 700ix to their ArF immersion installed base. Essentially eliminating bandwidth as a source of variation to improve on-wafer critical dimension (CD) uniformity, the XLR 700ix and DynaPulse utilize the same patented technology to tightly control bandwidth specifications (300+5fm) and achieve stable on-wafer performance.
“Customers have recognized the new performance, process stability and sustainability improvements of the XLR 700ix to enable higher system efficiency for leading-edge manufacturing applications, and are eager to realize the same benefits within their installed base,” said Ed Brown, Chief Executive Officer of Cymer Light Source. “DynaPulse now makes it easier for chipmakers to achieve a high level of performance and productivity across their entire ArF immersion light source fleet.”
From enhanced service to product upgrade options, such as SmartPulse™ and DynaPulse, OnPulse customers experience reduced cost of operation, enhanced productivity and predictable costs that scale directly with wafer production. For example, the SmartPulse data capture and analysis tool enables chipmakers to better monitor key light source parameters in real-time, with field-to-field resolution, prevent excursions and make adjustments to achieve a high level of performance, and ultimately increase wafer output per tool. SmartPulse enables chipmakers to better monitor and keep light sources within tighter bandwidth control achieved with DynaPulse.
As the newest additions to the family, XLR 700ix and DynaPulse demonstrate Cymer’s continued investment in research and development to support DUV technology extensions for 14nm chip manufacturing and beyond.