ASML Honors TRUMPF For New EUV Laser

Close and exclusive partnership with ASML enables chip manufacturers worldwide to create more reliable and resource-saving lithography systems // TRUMPF sets new standards in efficiency and sustainability in chip production with innovative design

The Dutch technology company ASML yesterday honored TRUMPF with its prestigious Supplier Award in the "Technology" category. The award recognizes the successful development and first light of a new EUV high-energy laser, which will power ASML's next generation of EUV lithography systems to produce the world's most powerful microchips. TRUMPF recently successfully tested the laser for the first time, and series production is scheduled to begin in 2026.

“ASML is very excited about the new TRUMPF lasers, as they are expected to increase the availability and performance of our EUV products while consuming less energy,” says Sheila Leenders, Senior Vice President of Strategic Sourcing and Procurement at ASML.

With more than 450,000 individual parts and a weight of over 20 tons, the new EUV laser marks a milestone in semiconductor manufacturing. The system was fundamentally redesigned by TRUMPF to further increase reliability and availability in chip factories. At the same time, the new laser consumes less energy, thus contributing to resource conservation and CO₂ reduction .

"The award from ASML is a special recognition of our team's commitment and innovative strength. At the same time, it underscores the importance of our close partnership with ASML. As a technology leader in the semiconductor industry, the company continues to set new standards in sustainability and innovation. Together, we are driving forward the development of future-oriented solutions for chip manufacturing," says Volker Jacobsen, CEO EUV at TRUMPF.

ASML presented the award to TRUMPF on October 23, 2025, as part of the ASML Suppliers' Day. The first new high-energy lasers are scheduled to be delivered to ASML in 2026.