Advancing Laser Technology: Ophir Discusses The Importance Of Measuring M2

In a new feature, AZoOptics interviews Reuven Silverman to discuss Ophir's contributions to advanced laser measurement technology.

Reuven Silverman serves as the Business Unit Manager for the Instruments group at MKS, overseeing the Ophir Photonics and Newport Instruments divisions. With over 30 years of experience in business, research and development, and marketing, he has a solid foundation in the industry, holding a Bachelor of Science from Columbia University and a Master of Science from Northeastern University.

In his discussion, Silverman highlights the significance of M2 measurements in laser technology, which define a laser's focus ability and its application effectiveness. Accurate M2 measurements are crucial for both manufacturers and users, aiding in optics alignment, calibration, and quality control while preventing malfunctions due to component degradation.

Ophir distinguishes itself in the market with its BeamSquared M2 measurement system, known for its usability, accuracy, and ability to conduct measurements over extended optical paths. The system's speed, enabled by automation and sophisticated algorithms, allows M2 analysis in just one minute.

Silverman also introduces new products, including BeamPeek™, a real-time beam profiling system designed for additive manufacturing applications, and a high-end CMOS camera that enhances measurement resolution for NIR wavelengths. Looking ahead, he notes the trend towards integrating laser power and beam profiling measurements in single units, enabling ease of use and accuracy.

Customer feedback is integral to Ophir's product development, ensuring that their offerings meet the evolving needs of the market. Silverman advises professionals to accurately measure their laser systems to ensure optimal performance.