SPIE Photomask Technology 2014
September 16 - 18, 2014 - Monterey WA USSPIE - The international society for optics and photonics
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The 34th Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Mask Making + Mask data preparation + Substrates and materials + Patterning tools and processes + Resist and resist processing + Etch techniques + Metrology + Inspection + Repair + Cleaning, contamination, and haze + Simulation of mask making + Mask process correction Larger Glass, Smaller Fields, and Materials for 450mm + Impact of 450mm wafers on reticle and infrastructure + Tool developments to support larger blanks + Material developments + Interactions with magnifications + Impact of stitching for mask making and design Emerging Mask Technologies + EUV mask making + EUV mask inspection and repair + EUV mask infrastructure + EUV mask application + Nano imprint mask making + Nano imprint mask application + Pixelated masks + Alternative mask technologies + Grey-scale masks + Direct-write, ML² Mask Application + Double- and multi-patterning + Resolution enhancement techniques and OPC + Source/mask optimization + Design for manufacturability + Patterned media + Simulation and modeling + Inverse lithography technology Mask Business + Mask manufacturing control + Mask shop management + Mask management in wafer fabs + Business aspects of masks + Infrastructure challenges Registration: Open: May 2014 Close: 2 September 2014 Submission Date: Abstract: 24 March 2014 MSS: 18 August 2014