Fused Silica For High Energy Lasers
SK-1300 Series Fused Silica is crafted using an advanced VAD method, an innovative process that ensures unparalleled purity with total metallic impurities kept below 0.5 ppm.
With controlled OH content of 1ppm or less, the SK-1300 guarantees high heat resistance and exceptional transparency across the ultraviolet, visible, and infrared spectrum, especially in the SK-1310 variant.
Free from bubbles and striae, the SK-1300 boasts outstanding laser resistance properties, making it ideal for a range of applications. From wafer production for TFT and SOI devices to photomask substrates for ultra-LSI and LCD, and optical elements like lenses, mirrors, and windows for ultraviolet and vacuum ultraviolet applications, our SK-1300 Series Fused Silica is your reliable choice. Available in round plates ranging from 50 to 500mm and square plates from 50 to 1000mm, it sets the standard for quality and performance in the realm of high-energy lasers.