Articles
A High Rate Reactive Sputtering Process For Batch, In-Line, Or Roll Coaters
November 12, 2008
White Paper: A High Rate Reactive Sputtering Process For Batch, In-Line, Or Roll Coaters
By N. Boling, B. Wood and P. Morand, Deposition Sciences Inc., Santa Rosa, CA
DC and so-called quasi dc reactive sputtering of dielectrics have advanced rapidly during the past several years. Keys to much of the advance have been active feedback control of partial pressure, new arc suppression systems, and use of auxiliary plasmas to increase deposition rates. In this paper we describe a high rate system, MicroDyn®, incorporating all of these features.
The MicroDyn® process was originally developed for use in rotating drum batch coaters in which deposition of each layer can be accomplished by multiple passes under a target. Specifically, the process has been very successfully used to batch deposit hot mirror coatings on halogen lamps for energy savings. Recently, it has also been successfully applied to in-line and roll-coaters where relatively thick layers must be deposited in a single pass under a target. Deposition rates of several materials, including arcing prone materials such as SiO2 and Al2O3 , are several times faster than those achieved by conventional sputtering processes.
Click Here To Download:White Paper: A High Rate Reactive Sputtering Process For Batch, In-Line, Or Roll Coaters
SOURCE: Deposition Sciences, Inc. (DSI)



